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OptoNano 200
Accurate Measurement Tools
Built on patented Optical Microsphere Nanoscopy (OMN) technologies, is able to resolve target features down to 137nm scale in visible light and ambient air observation, breaking the ~200nm Abbe’s resolution limit and bridging a major gap between optical and electron microscopy.
Accurate In-situ Measurement Tools
Nano pixel is segmented distinctly to achieve higher precision, accuracy and consistency of measurement
Objective Lens and Focusing Stage
Creates seamless and adaptive Graphical User Interface (GUI) for your workflow
Siper Resolution Visible Light Nano-Imaging
Z Axis Travel Range up to 35mm with Loading Capacity of 2kg
Extended Depth Of Field (EDoF)
Over coming limitation of Depth of Field (DoF) from microscope objective lens, high resolution with crystal clear images will be captured with stacking multiple layers together.
Extended Field of View (EFoV)
Stitching multiple field of view together is necessary to obtain a comprehensive data outlook in a single image, while retaining super resolution.
FEATURES
Auto Focus
At the user’s choice, autofocus is easily deployed on the camera setting, allowing users to achieve optimized imaging automatically on target observation.
Image Stitching
Designed in high-resolution (100x lens) and super-resolution (ON200 Lens applied) applications which enable the construction of a high-quality image of larger sample areas (expanded FOV).
High Accuracy Measuring Tools
Enable users to conduct both live-view and still image measurement with ease, with 0.5% +/- tolerance (point to point distance measurement), to further enable application analysis.